ICP Reaktor

Inductively Coupled Plasma Reactor is fully automatic compact tabletop equipment, custom designed and built for particular research needs. It can be used for broad range of R&D applications including (but not limited to) well known processes as deposition, etching, ashing, surface functionalization.

pokračovat

Features and Benefits

RF plasma generation 13.56 MHz (frequency range 10-18 MHz applicable)
Automatic LC circuit matching box (frequency tunning also applicable)
Adjustable RF plasma power 10-300 W (pressure range 1-250 Pa)
Flow rates controlled by MFCs (maximum number of gas lines: 5) installed on the gas panel (together with pneumatic valves, check valves, gas filters and manual shut-off valves)
Optionally, line for liquid precursor dosing by CEM can be installed
Quartz plasma chamber
External pumping system (connection to the ICP reactor by DN25KF) according to customer requirements with the option of the pressure control by throttle valve
Air cooled system (no cooling water required)
CDA connection (6 bar) required for the control of pneumatic gas valves
System voltage 100-240 V
Max power consumption 1 kW